Ukunemba okuphezulu kwe-Laser perforation yengilazi nepulasitiki
Izici:
1. I-laser ye-UV enamandla amakhulu futhi ezinzile isetshenziselwa ukushisisa ngokuqondile okokusebenza okuhwamuke, ngendawo ethinteke ekushiseni yeleveli engu-μm kanye nendawo yokucubungula okungenani engu-5μm.
2. Ukushintsha kwe-beam kulawulwa ngesivinini esikhulu kanye nokunemba okuphezulu nge-galvanometer enembile ukuze kubonakale ukufakwa kokunemba kwejubane eliphezulu kwefomethi encane.
3. Ukuma okunembayo nokucutshungulwa kwezimbobo ezincane ezinemba okuphezulu kubonakala ngokuhumusha isigaba sokuhumusha esinembayo esiphezulu;
4. I-axis ye-Z ilungiseka ngogesi ukuze igxile ngokuqondile ukuze ihlangabezane nezidingo zokucubungula izinto ezinobukhulu obuhlukahlukene.
5. Ukugxila okuphezulu kwekhamera yemboni ye-rangefinder enesinqumo esiphezulu kuqinisekisa ukuzinza nokunemba kwesikhathi eside kwesistimu.
6. Uhlelo lwamukela ama-countertops emabula ukuze kuthuthukiswe ukuzinza okuphelele kwesistimu, futhi zonke izingxenye zemishini zikhethwa ngokucophelela ukuze kuqinisekiswe ukunemba kwesikhathi eside.
7. Ingasetshenziselwa ukucubungula izinsimbi, i-ceramics, i-organics, ingilazi nezinye izinto ukuze kuzuzwe i-etching, izimbobo eziyimpumputhe, ngokusebenzisa imigodi, i-slotting, ukusika, njll.
8. Ububanzi obuncane bomugqa wokucubungula bungaphansi kuka-5μm.
Ibanga lesicelo:
I-Semiconductor flexible circuit board cutting, i-ITO film etching, ukukhiqiza idivayisi ye-microelectronic, ukulungiswa kwesifanekiso sokuphrinta, ukulungiswa kwe-biochip, ukunemba okuncane
Ukubumba isikhunta
Qaphela: Izinga lokushisa elihlala njalo (25±0.5℃), elitholwe ngemva kokushisisa kuqala imizuzu engama-30